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Study of integration issues in shallow trench isolation for deep submicron CMOS technologies

著者名:
Chatterjee,A. ( Texas Instruments Inc. )
Mason,M.E.
Joyner,K.
Rogers,D.
Mercer,D.
Kuehne,J.
Esquivel,A.L.
Mei,P.
Murtaza,S.S.
Taylor,K.J.
Ali,I.
Nag,S.
O'Brien,S.
Ashburn,S.
さらに 9 件
掲載資料名:
Microelectronic Device and Multilevel Interconnection Technology II
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2875
発行年:
1996
開始ページ:
39
終了ページ:
47
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422736 [0819422738]
言語:
英語
請求記号:
P63600/2875
資料種別:
国際会議録

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