1.

国際会議録
国際会議録
1. Deep-ultraviolet antireflective coating with improved conformality,optical density,and etch rate
Guerrero,D.J. ; Meador,J.D. ; Xu,G. ; Suzuki,H. ; Sone,Y. ; Krishnamurthy,V. ; Claypool,J. ; Lamb,III,J.E.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.228-235,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Second-generation 193-nm bottom antireflective coatings(BARCs)
Meador,J.D. ; Shao,X. ; Krishnamurthy,V. ; Arjona,M. ; Bhave,M. ; Xu,G. ; Claypool,J.B. ; Lindgren,A.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1009-1018,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
3.

国際会議録
国際会議録
3. Removable organic antireflection coating
Sturtevant,J.L. ; Insalaco,L.J. ; Flaim,T. ; Krishnamurthy,V. ; Meador,J.D. ; Petersen,J.S. ; Eckert,A.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.738-746,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724