1.

国際会議録
国際会議録
1. PN and SOI wafer flow process for stencil mask fabrication
Butschke,J. ; Ehrmann,A. ; Haugeneder,E. ; Irmscher,M. ; Kasmaier,R. ; Kragler,K. ; Letzkus,F. ; Loschner,H. ; Mathuni,J. ; Rangelow,I.W. ; Reuter,C. ; Shi,F. ; Springer,R.
出版情報: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.20-29,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3665
2.

国際会議録
国際会議録
2. Progress in placement control for ion beam stencil mask technology
Kamm,F.-M. ; Ehrmann,A. ; Struck,T. ; Kragler,K. ; Butschke,J. ; Letzkus,F. ; Springer,R. ; Haugeneder,E. ; Degen,A. ; Voigt,J. ; Kratzenberg,M. ; Rangelow,I.W.
出版情報: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.18-22,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4349
3.

国際会議録
国際会議録
3. Resist technologies for ion projection lithography(IPL)stencil maskmaking
Irmscher,M. ; Butschke,J. ; Elian,K. ; Hoefflinger,B. ; Kragler,K. ; Letzkus,F. ; Ochsenhirt,J. ; Reuter,C. ; Springer,R.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.362-372,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
4.

国際会議録
国際会議録
4. Progress in placement control for ion beam stencil mask technology
Kamm,F.-M. ; Ehrmann,A. ; Struck,T. ; Kragler,K. ; Bustschke,J. ; Letzkus,F. ; Springer,R. ; Haugeneder,E.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.460-465,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
5.

国際会議録
国際会議録
5. Stencil mask technology for ion beam lithography
Ehrmann,A. ; Huber,S. ; Kasmaier,R. ; Oelmann,A.B. ; Struck,T. ; Springer,R. ; Butschke,J. ; Letzkus,F. ; Kragler,K. ; Loschner,H. ; Rangelow,I.W.
出版情報: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.194-205,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3546