1.

国際会議録
国際会議録
1. Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153]
Yedur, S. ; Vuong, V. ; Shivaprasad, D. ; Sarathy, T. P. ; Tabet, M. ; Korlahalli, R. ; Hu, J.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
2.

国際会議録
国際会議録
2. Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM
Yang, W. ; Lowe-Webb, R. ; Korlahalli, R. ; Zhuang, V.G. ; Sasano, H. ; Liu, W. ; Mui, D.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.966-976,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
3.

国際会議録
国際会議録
3. Characterization of interfacial layers and surface roughness using spectroscopic reflectance, spectroscopic ellipsometry, and atomic force microscopy
Hoobler, R.J. ; Korlahalli, R. ; Boltich, E. ; Serafin, J.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.756-764,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689