New OPC methods to increase process margin for sub-70nm devices
- 著者名:
- Hong, J. -S. ( SAMSUNG Electronics Co. , Ltd. (South Korea) )
- Kim, D. -H. ( SAMSUNG Electronics Co. , Ltd. (South Korea) )
- Kim, S. -W. ( SAMSUNG Electronics Co. , Ltd. (South Korea) )
- Yoo, M. -H. ( SAMSUNG Electronics Co. , Ltd. (South Korea) )
- Kong, J. -T. ( SAMSUNG Electronics Co. , Ltd. (South Korea) )
- 掲載資料名:
- Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5756
- 発行年:
- 2005
- 開始ページ:
- 302
- 終了ページ:
- 312
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457363 [0819457361]
- 言語:
- 英語
- 請求記号:
- P63600/5756
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
国際会議録
Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
MEEF-based correction to achieve OPC convergence of low-kl lithography with strong OAI [6154-25]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |