1.

国際会議録
国際会議録
1. ROUGHNESS EFFECTS DURING FOCUSED ION BEAM REPAIR OF X-RAY MASKS WITH POLYCRYSTALLINE TUNGSTEN ABSORBERS
Kola, R.R. ; Celler, G.K. ; Harriott, L.R.
出版情報: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.593-598,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 279
2.

国際会議録
国際会議録
2. *CHANGES IN ELECTRONIC DEVICE PROPERTIES DURING THE FORMATION OF DISLOCATIONS
Ross, F.M. ; Hull, R. ; Bahnck, D. ; Bean, J.C. ; Peticolas, L.J. ; Kola, R.R. ; King, C.A.
出版情報: Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.483-492,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 280
3.

国際会議録
国際会議録
3. Radio-Frequency Impedance Analysis of Anodic Tantalum Pentoxide Thin Films
Duenas, S. ; Castan, H. ; Barbolla, J. ; Kola, R.R. ; Sullivan, P.A.
出版情報: Electrically based microstructural characterization III : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A..  pp.185-190,  2002.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 699
4.

国際会議録
国際会議録
4. High Quality Silicon Oxide Dielectric Films By Molecular Beam Deposition
Chand, Naresh ; Kola, R.R. ; Opila, R.L. ; Comizzoli, R.B. ; Krautter, H. ; Chu, S.N.G. ; Osenbach, J.W.
出版情報: Proceedings of the Symposium on Nondestructive Wafer Characterization for Compound Semiconductor Materials and the twenty-second State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXII).  pp.356-370,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-6