Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]
- 著者名:
Yang, D. S. ( Samsung Electronics (South Korea) ) Jung, M. H. ( Samsung Electronics (South Korea) ) Lee, Y. M. ( Samsung Electronics (South Korea) ) Koh, C. W. ( Samsung Electronics (South Korea) ) Yeo, G. S. ( Samsung Electronics (South Korea) ) Woo, S. G. ( Samsung Electronics (South Korea) ) Cho, H. K. ( Samsung Electronics (South Korea) ) Moon, J. T. ( SAMUNG Electronics Co Ltd (South Korea) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61522K
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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