Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.
出版情報:
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.188-196, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
出版情報:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
出版情報:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Koepernik, C. ; Beyer, D. ; Dress, P. ; Hoffmann, T. ; Hudek, P. ; Irmscher, M. ; Krauss, C. ; Leibold, B. ; Mueller, D. ; Reuter, C. ; Springer, R. ; Szekeresch, J. ; Voehringer, P.
出版情報:
22nd Annual BACUS Symposium on Photomask Technology. Part One pp.725-736, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Constantine, C. ; Hoffmann, T. ; Koepernik, C. ; Krauss, C. ; Leibold, B. ; Letzkus, F. ; Mueller, D. ; Springer, R. ; Voehringer, P.
出版情報:
Photomask and Next-Generation Lithography Mask Technology IX. pp.176-187, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Hudek, P. ; Koepernik, C. ; Plumhoff, J. ; Rausa, E. ; Sato, M. ; Voehringer, P.
出版情報:
Photomask and Next-Generation Lithography Mask Technology XI. pp.46-57, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering