1.

国際会議録
国際会議録
1. Simulation of imaging in projection microscope using multibeam probe
Ko, Y.-U. ; Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.565-575,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
2.

国際会議録
国際会議録
2. Simulation of repairing thin-film phase defect in masks for EUV lithography
Ko, Y.-U. ; Joy, D.C. ; Hector, S.D. ; Lu, B.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.293-302,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038