1.

国際会議録
国際会議録
1. ELECTROCHEMICAL DETECTION OF IRON CONTAMINATION DURING SILICON WAFER CLEANING
Kneer, E.A. ; Raghavan, S. ; Jeon, J.S.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.377-384,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. Mechanistic Aspects of Chemical Mechanical Polishing of Tungsten Using Ferric Ion Based Alumina Slurries
Raghunath, C. ; Lee, K.T. ; Kneer, E.A. ; Mathew, V. ; Raghavan, S.
出版情報: Proceedings of the First International Symposium on Chemical Mechanical Planarization.  pp.1-15,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-22