1.

国際会議録
国際会議録
1. Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication
Kim,K. ; Mason,M.E. ; Randall,J.N. ; Kim,W.D.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.132-148,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
2.

国際会議録
国際会議録
2. Application of distributed PVDF actuators to the control of sound transmission through composite plate
Yoon,K.W. ; Kim,S.J. ; Kim,W.D.
出版情報: Smart structures and materials 1997 : smart structures and integrated systems : 3-6 March 1997, San Diego, California.  pp.846-855,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3041
3.

国際会議録
国際会議録
3. 193-nm thin-layer imaging performance of 140-nm contact hole patterning and DOE dry development process optimization of multilayer resist process
Kim,W.D. ; Hwang,S.B. ; Rich,G.K. ; Graffenberg,V.L.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1028-1045,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
4.

国際会議録
国際会議録
4. Hardmask/BARC materials for 157-nm lithography
Kim,W.D. ; Miller,D.A. ; Kim,H.S. ; Byers,J.D. ; Daniels,M. ; Birmingham,B. ; Tompkins,J.
出版情報: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.93-106,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4226
5.

国際会議録
国際会議録
5. Wafer FAB experience of implementing 50-Vk vector e-beam mask writer and bry etch process for 130-nm technology node generation
Kim,W.D. ; Bennett,B.D. ; Ma,M.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.353-361,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562
6.

国際会議録
国際会議録
6. Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform
Kim,K. ; Wells,G.M. ; Kim,W.D. ; Choi,Y.-J. ; Choi,S.-J. ; Kim,Y.-S. ; Kim,D.-B.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.168-178,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345