1.

国際会議録
国際会議録
1. Bonding technologies ofr silicon scanning mirror having vertical comb fingers
Lee, J.-H. ; Ko, Y.-C. ; Choi, B.-S. ; Kim, J.-M. ; Jeon, D.-Y.
出版情報: Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia.  pp.428-435,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4592
2.

国際会議録
国際会議録
2. PHOTOINDUCED CHARGE TRANSFER STUDIES IN BOLAAMPHIPHILEGRAMICIDIN-PORPHYRIN MEMBRANES
Thompson, David H. ; Kim, J.-M.
出版情報: Macromolecular host-guest complexes : optical, optoelectronic, and photorefractive properties and applications : symposium held April 27-28, 1992, San Francisco, California, U.S.A..  pp.93-98,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 277
3.

国際会議録
国際会議録
3. Effect of Viscosity of Liquid Resin on Resin Self-Alignment Capability
Kim, J.-M. ; Shin, Y.-E. ; Fujimoto, K.
出版情報: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.12-17,  2003.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 439
4.

国際会議録
国際会議録
4. Lithographic importance of acid diffusion in chemically amplified resists
Noh, C.-H. ; Kim, J.-Y. ; Lee, H.-C. ; Hwang, O.-C. ; Cho, S.-H. ; Song, K.-Y. ; Kim, J.-M.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.269-280,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
5.

国際会議録
国際会議録
5. Production and Properties of Glass-Ceramic from Incinerator Fly Ash
Kim, H.-S. ; Kim, J.-M. ; Oshikawa, T. ; Ikeda, K.
出版情報: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.180-185,  2003.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 439
6.

国際会議録
国際会議録
6. Fabrication of micromachined ceramic thin-film-type pressure sensors for overpressure tolerance and its characteristics
Chung, G.-S. ; Kim, J.-M.
出版情報: Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia.  pp.11-18,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5276
7.

国際会議録
国際会議録
7. Measurement Method of Carbon Char Content from Industry Sludge
Kim, H.-S. ; Kim, J.-M.
出版情報: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.137-142,  2003.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 439
8.

国際会議録
国際会議録
8. Laser TV for home theater
Lee, J.-H. ; Mun, Y.-K. ; Do, S.-W. ; Ko, Y.-C. ; Kong, D.-H. ; Choi, B.-S. ; Kim, J.-M. ; Hong, C.-W. ; Jeon, D.-Y.
出版情報: Projection Displays VIII.  pp.138-146,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4657
9.

国際会議録
国際会議録
9. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]
Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.58-65,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853
10.

国際会議録
国際会議録
10. A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03]
Yang, S.-J. ; Seo, S.-M. ; Ko, S.-H. ; Cha, H.-S. ; Kang, G.-W. ; Nam, K.-S. ; Seo. W.-W. ; Jung, W.-K. ; Cho, H.-K. ; Kim, J.-M. ; Choi, S.-S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.20-30,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853