1.

国際会議録
国際会議録
1. The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films
Kim, J.-B. ; Park, J.-Y.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.319-328,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Material design and evaluation of nanocomposite resist for next generation lithography
Kim, J.-B. ; Kim, K.-S.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.467-475,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
3.

国際会議録
国際会議録
3. Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography
Ganesan, R. ; Choi, J.-H. ; Yun, H.-J. ; Kwon, Y.-G. ; Kim, K.-S. ; Oh, T.-H. ; Kim, J.-B.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.40-51,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
4.

テクニカルペーパー
テクニカルペーパー
4. The Aerodynamics Simulation of Air Ventilation Performance and the Process Development of Air Ventilation Design Tool.
Park, S.-G. ; Kim, J.-B. ; Song, S.-h. ; Cho, J.-h.
出版情報: 2004 SAE world congress : technical paper.  2004.  Warrendale, Penn..  Society of Automotive Engineers
シリーズ名: Society of Automotive Engineers technical paper series
シリーズ巻号: 2004
5.

国際会議録
国際会議録
5. Molecular resists with t-butyl cholate as a dendrimer core
Kim, J.-B. ; Oh, T.-H. ; Kwon, Y.-G.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.549-556,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
6.

国際会議録
国際会議録
6. Novel alicyclic polmers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography
Lee, J.-J. ; Kim, J.-B. ; Honda, K.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.110-119,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
7.

国際会議録
国際会議録
7. Novel molecular resists based on inclusion complex of cyclodextrin
Kim, J.-B. ; Kwon, Y.-G. ; Yun, H.-J. ; Choi, J.-H.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.837-845,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
8.

国際会議録
国際会議録
8. Water-developable resists based on glyceryl methacrylate for 193-nm lithography
Kim, J.-B. ; Jang, J.-H. ; Choi, J.-H. ; Lee, K.-K. ; Ko, J.-S.
出版情報: Advances in Resist Technology and Processing XXI.  pp.616-624,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
9.

国際会議録
国際会議録
9. Nonshrinkable photoresists for ArF lithography
Kim, J.-B. ; Oh, T.H. ; Choi, J.-H. ; Lee, J.-J.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.689-697,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
10.

国際会議録
国際会議録
10. Synthesis of norbornene copolymers with diazo groups and their application as DUV resists
Kim, J.-B. ; Kim, K.S.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.655-664,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039