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出版情報:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
Trauwaert, M.-A. ; Kenis, K. ; Caymax, M. ; Mertens, P.W. ; Heyns, M.M. ; Vanhellemont, J. ; Graf, D. ; Wagner, P.
出版情報:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.455-462, 1997. Pennington, NJ. Electrochemical Society
Gendt, S. de ; Kenis, K. ; Baeyens, M. ; Mertens, P. W. ; Heyns, M. M. ; Wiener, G. ; Kidd, S. J. ; Knotter, D. M. ; Bokx, P. K. de
出版情報:
Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.. pp.397-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.352-366, 1996. Pennington, NJ. Electrochemical Society
Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.
出版情報:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.147-155, 2001. Pennington, N.J.. Electrochemical Society