1.

国際会議録
国際会議録
1. A STUDY ON FILM PRECURSORS IN SiH4 THERMAL CVD BY USE OF TRENCH COVERAGE MEASUREMENTS
Yuuki, Akimasa ; Kawahara, Takaaki ; Matsui, Yasuji ; Tachibana, Kunihide
出版情報: Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A..  pp.121-126,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 146
2.

国際会議録
国際会議録
2. Dielectric Breakdown Characteristics of poly-Si/HfAlOx/SiON Gate Stack
Torii, Kazuyoshi ; Ohji, Hiroshi ; Mutoh, Akiyoshi ; Kawahara, Takaaki ; Mitsuhashi, Riichiro ; Horiuchi, Atsushi ; Miyazaki, S. ; Kitajima, Hiroshi
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.37-42,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
3.

国際会議録
国際会議録
3. Physical and Electrical Properties of Al2O3, HfO2, and Their Alloy Films Prepared by Atomic Layer Deposition for 65nm CMOS Gate Dielectric
Kawahara, Takaaki ; Torii, Kazuyoshi ; Fukuda, Seiichi ; Maeda, Takeshi ; Horiuchi, Atsushi ; Ito, Hiroyuki ; Muto, Akiyoshi ; Kato, Yoshitake ; Kitajima, Hiroshi
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.155-160,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745