Process monitoring using surface charge profiling(SCP)method
- 著者名:
- Ruzyllo,J. ( The Pennsylvania State Univ. )
- Roman,P.
- Staffa,J.
- Kashkoush,I.
- Kamieniecki,E.
- 掲載資料名:
- Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2876
- 発行年:
- 1996
- 開始ページ:
- 162
- 終了ページ:
- 173
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422743 [0819422746]
- 言語:
- 英語
- 請求記号:
- P63600/2876
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
MRS - Materials Research Society |
2
国際会議録
Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |