1.

国際会議録
国際会議録
1. Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances
Liu,H.-Y. ; Karklin,L. ; Wang,Y.-T. ; Pati,Y.C.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.2-14,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
2.

国際会議録
国際会議録
2. Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system
Phan,K.A. ; Spence,C.A. ; Dakshina-Murthy,S. ; Bala,V. ; Williams,A.M. ; Strener,S. ; Eandi,R.D. ; Li,J. ; Karklin,L.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.681-694,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
3.

国際会議録
国際会議録
3. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Kling,M.E. ; Cave,N. ; Falch,B.J. ; Fu,C.-C. ; Green,K.G. ; Lucas,K.D. ; Roman,B.J. ; Reich,A.J. ; Sturtevant,J.L. ; Tian,R. ; Russell,D.R. ; Karklin,L. ; Wang,Y.-T.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.10-17,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
4.

国際会議録
国際会議録
4. Mask quality(control)evaluation using the Virtual Stepper System(VSS)
Karklin,L. ; Weed,J.T. ; Li,J.
出版情報: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.123-125,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3996
5.

国際会議録
国際会議録
5. Photomask quality control by Virtual Stepper system for subwavelength photomasks
Karklin,L. ; Mazor,S.
出版情報: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.512-517,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4409
6.

国際会議録
国際会議録
6. Comprehensive simulation study of the photomask defects printability
Karklin,L.
出版情報: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.490-504,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2621
7.

国際会議録
国際会議録
7. Detection and printability of random and programmed pinholes on Cr photomasks
Kalk,F.D. ; Vacca,A. ; Howard,C. ; Karklin,L.
出版情報: Photomask and X-Ray Mask Technology III.  pp.267-278,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2793
8.

国際会議録
国際会議録
8. Advanced procedure to evaluate process performance at very low k1 based on device parameters linked to lithography and process data: ？. Verification of cell layout based on integration of optical and electrical simulations
Balasinski,A. ; Iandolo,W. ; Joshi,D. ; Karklin,L. ; Axelrad,V.
出版情報: Optical Microlithography XIV.  4346  pp.1514-1521,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
9.

国際会議録
国際会議録
9. Automatic defect severity scoring for 193-nm reticle defect inspection
Karklin,L. ; Altamirano,M.M. ; Cai,L. ; Phan,K.A. ; Spence,C.A.
出版情報: Optical Microlithography XIV.  4346  pp.898-906,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
10.

国際会議録
国際会議録
10. Simulation study of reticle enhancement technology applications for 157-nm lithography
Schurz,D.L. ; Flack,W.W. ; Karklin,L.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.902-913,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562