1.

国際会議録
国際会議録
1. Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers
Shew, B.-Y. ; Huang, R.-S. ; Wang, D.-J. ; Perng, S.-Y. ; Kuan, C.-K. ; Cai, Y.Q. ; Chow, P.C. ; Schwoerer-Boehning, M. ; Caliebe, W. ; Kao, C.-C. ; Chen, C.T.
出版情報: Design and microfabrication of novel x-ray optics : 9 July 2002, Seattle, Wasington, USA.  pp.131-138,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4783
2.

国際会議録
国際会議録
2. Effect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-off
Chu, J.-T. ; Liang, W, -D. ; Kao, C.-C. ; Huang, H.-W. ; Chu, C.-F. ; Kuo, H.-C. ; Wang, S.C.
出版情報: Light-Emitting Diodes: Research, Manufacturing, and Applications IX.  pp.233-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5739