One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application

One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application

著者名:

Kang,H.-J. ( Samsung Electronics Co., Ltd. )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

Two of Two Parts

開始ページ:

1096

終了ページ:

1103

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 Emergence of assist feature OPC era in sub-130-nm DRAM devices Kim,B., Kim,I., Yeo,G., Lee,J., Choi,J., Cho,H., Moon,J. SPIE-The International Society for Optical Engineering	7 国際会議録 A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices D. Park, S. Kim, C. Hwang, S. Lee, H. Cho, J. Moon SPIE - The International Society of Optical Engineering
2 国際会議録 Fulfillment of model-based OPC for contact patterns in 60-nm level logic device Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S. SPIE - The International Society of Optical Engineering	8 国際会議録 Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF Park,J., Yeo,G., Kim,I., Kim,B.-S., Lee,J., Cho,H., Moon,J.T. SPIE-The International Society for Optical Engineering	9 国際会議録 OPC accuracy and process window verification methodology for sub-100-nm node Yang, H., Park, C., Hong, J., Jeong, G., Cho, B., Choi, J., Kang, C., Yang, K., Kang, E., Ji, S., Yim, D., Song, Y. SPIE - The International Society of Optical Engineering
4 国際会議録 ArF issues of 90-nm-node DRAM device integration Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering	10 国際会議録 A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns Lee, S., Hwang, C., Park, D.-W., Kim, I.-S., Kim, H.-C., Woo, S.-G., Cho, H.-K., Moon, J.-T. SPIE - The International Society of Optical Engineering
5 国際会議録 Successful application of angular scatterometry to process control in sub-100-nm DRAM device Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., … SPIE - The International Society of Optical Engineering	11 国際会議録 Realization of sub-80-nm small-space patterning in ArF photolithography Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, … SPIE - The International Society of Optical Engineering
6 国際会議録 Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32] Jung, S., Kim, I.-S., Kang, Y.-S., Yeo, G.-S., Woo, S.-G., Cho. H., Moon, K.-T. SPIE - The International Society of Optical Engineering	12 国際会議録 Evaluation of ArF CLM in the sub-100-nm DRAM cell Lee, J.-H., Chung, D.-H., Kim, H.-C., Nam, D.-S., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12