1.

国際会議録
国際会議録
1. EFFECTS OF HALOGEN-CONTAINING GAS PLASMA AND RAPID THERMAL ANNEAL TREATMENT ON THE REACTIVE ION ETCHED SILICON
Kwon, Kwang-Ho ; Kim, Bo-Woo ; Park, Hyung-Ho ; Kang, Jin-Yeong ; Yeom, Gun-Yung
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.481-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
2.

国際会議録
国際会議録
2. Mechanistic Understanding of the Stress-Induced Failure of Si3N4 Metal-Insulator-Metal Capacitors
Suh, Dongwoo ; Mheen, Bongki ; Lee, Seung-Yun ; Shim, Kyu-Hwan ; Kang, Jin-Yeong
出版情報: Thin films : stresses and mechanical properties IX : symposium held November 26-30, 2001, Boston, Massachusetts, U.S.A..  pp.275-284,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 695