1.

国際会議録
国際会議録
1. Approach to CD-SEM metrology utilizing the full waveform signal
McIntosh,J.M. ; Kane,B.C. ; Bindell,J.B. ; Vartuli,C.B.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.51-60,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Dimensional metrology system of shape and scale in pattern transfer
Mclntosh,J.M. ; Kane,B.C. ; Houge,E.C. ; Vartuli,C.B. ; Mei,X.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.206-217,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
3.

国際会議録
国際会議録
3. Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology
Kizilyalli,I.C. ; Huang,R.Y. ; Hwang,D. ; Kane,B.C. ; Ashton,R. ; Kuehne,S. ; Deng,X. ; Twiford,M.S. ; Martin,E.P. ; Shuttleworth,O. ; Wittingham,K. ; Lytle,S. ; Ma,Y. ; Roy,P.K. ; Olmer,L. ; Vaidya,H. ; Li,F. ; Li,X. ; Persson,E. ; Massengale,A.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.175-181,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506