1.

国際会議録
国際会議録
1. Influence of photoresist feature geometry on ECR plasma-etched HgCdTe trenches
Benson, J.D. ; Stoltz, A.J., Jr. ; Kaleczyc, A.W. ; Martinka, M. ; Almeida, L.A. ; Boyd, P.R. ; Dinan, J.H.
出版情報: Materials for infrared detectors II : 8-9 July 2002 ,Seattle, Washington, USA.  pp.129-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4795
2.

国際会議録
国際会議録
2. Fullerene incorporation in DNQ Novolak photoresist for increasing plasma etch resistance
Benson, J.D. ; Stoltz, A.J., Jr. ; Kaleczyc, A.W. ; Dinan, J.H.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.1224-1227,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690