1.

国際会議録
国際会議録
1. Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films
Edwards, N.V. ; Vella, J. ; Xie, Q. ; Zollner, S. ; Werho, D. ; Adhihetty, I. ; Liu, R. ; Tiwald, T.E. ; Russell, C. ; Vires, J. ; Junker, K.H.
出版情報: Surface engineering 2001 - fundamentals and applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A..  pp.101-106,  2002.  Warrendale, Penn.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 697
2.

国際会議録
国際会議録
2. Mechanical Properties and Porosity of Organo-silicate Glass (OSG) Low-k Dielectric Films
Vella, J.B. ; Xie, Q. ; Edwards, N.V. ; Kulik, J. ; Junker, K.H.
出版情報: Thin films : stresses and mechanical properties IX : symposium held November 26-30, 2001, Boston, Massachusetts, U.S.A..  pp.309-316,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 695