1.

国際会議録
国際会議録
1. Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
Bok,C.-K. ; Koh,C.-W. ; Jung,M.-H. ; Baik,K.-H. ; Kim,J.-B. ; Cheong,J.-H.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.501-511,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability
Lee,G. ; Koh,C.-W. ; Hong,S.-E. ; Jung,J.-C. ; Jung,M.-H. ; Kim,H.-S. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.13-22,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
3.

国際会議録
国際会議録
3. Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists
Hong,S.-E. ; Jung,M.-H. ; Jung,J.-C. ; Lee,G. ; Kim,J.-S. ; Koh,C.-W. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.966-973,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
4.

国際会議録
国際会議録
4. "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"
Koh,C.-W. ; Jung,J.-C. ; Kim,M.-S. ; Kong,K.-K. ; Lee,G. ; Jung,M.-H. ; Kim,J.-S. ; Shin,K.-S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.798-803,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
5.

国際会議録
国際会議録
5. Novel high-performance ArF resist for sub-100-nm lithography
Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.150-158,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345