1.

国際会議録
国際会議録
1. Novel single-layer photoresist containing cycloolefins for 193 nm
Park,J.-H. ; Seo,D.-C. ; Kim,K.-D. ; Park,S.-Y. ; Kim,S.-J. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.454-462,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. ArF photoresist system using alicyclic polymer
Park,J.-H. ; Kim,S.-J. ; Park,S.-Y. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.485-491,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
3.

国際会議録
国際会議録
3. ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability
Lee,G. ; Koh,C.-W. ; Hong,S.-E. ; Jung,J.-C. ; Jung,M.-H. ; Kim,H.-S. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.13-22,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
4.

国際会議録
国際会議録
4. Design of cycloolefin-maleic-anhydride resist for ArF lithography
Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.11-25,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
5.

国際会議録
国際会議録
5. Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist
Kim,S.-J. ; Park,J.-H. ; Kim,J.-H. ; Kim,K.-D. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.430-436,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
6.

国際会議録
国際会議録
6. Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists
Hong,S.-E. ; Jung,M.-H. ; Jung,J.-C. ; Lee,G. ; Kim,J.-S. ; Koh,C.-W. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.966-973,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
7.

国際会議録
国際会議録
7. Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist
Park,J.-H. ; Kim,J.-Y. ; Seo,D.-C. ; Park,S.-Y. ; Lee,H. ; Kim,S.-J. ; Jung,J.-C. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1163-1170,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
8.

国際会議録
国際会議録
8. AE characteristic for monitoring of fatigue crack in steel bridge members
Yoon,D.-J. ; Jung,J.-C. ; Park,P. ; Lee,S.-S.
出版情報: Nondestructive Evaluation of Highways, Utilities, and Pipelines IV.  pp.153-162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3995
9.

国際会議録
国際会議録
9. "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"
Koh,C.-W. ; Jung,J.-C. ; Kim,M.-S. ; Kong,K.-K. ; Lee,G. ; Jung,M.-H. ; Kim,J.-S. ; Shin,K.-S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.798-803,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
10.

国際会議録
国際会議録
10. Novel routes toward sub-70-nm contact windows by using new KrF photoresist
Kim,J.-S. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Shin,K.-S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.232-240,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345