1.

国際会議録
国際会議録
1. Manufacturability Issues for Application of Silicides in 0.25 ｦﾌm CMOS Process and Beyond
Wang, Q. F. ; Lauwers, A. ; Jonckx, F. ; Potter, M. de ; Chen, Chun-Cho ; Maex, K.
出版情報: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.221-,  1996.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 402
2.

国際会議録
国際会議録
2. Structural and Electrical Characterization of FeSix-Layers (1｡蛉｡？) Prepared by RTP of Fe Layers Sputtered on Si (100)
Libezny, M. ; Poortmans, J. ; Amesz, P. H. ; Donaton, R. A. ; Larsen, K. Kyllesbech ; Vandenabeele, P. ; Jonckx, F. ; Maex, K. ; Nijs, J.
出版情報: Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.389-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 387