Preparation and Characterization of (Sr1-xTix)O3 and (Ba1-xSrx)TiO3 Thin Films Using ECR Plasma Assisted MOCVD

Preparation and Characterization of (Sr1-xTix)O3 and (Ba1-xSrx)TiO3 Thin Films Using ECR Plasma Assisted MOCVD

著者名:

No, Kwangsoo

掲載資料名:

Ferroelectric thin films V : symposium held April 7-12, 1996, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

433

発行年:

1996

開始ページ:

9

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993365 [1558993363]

言語:

英語

請求記号:

M23500/433

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019837
シリーズID:	PA00000011
会議名:	Symposium on ferroelectric thin films
回次:	5th
会議開催地:	San Francisco, CA, USA
会議開催年:	1996.04.07-1996.04.12

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