A Quantitative Model for Oxide Erosion in Chemical Mechanical Polishing of Tungsten
- 著者名:
Yoon, B.U. Jeong, I.K Kim, J.Y. Lee, J.W. Hah, S.R. Moon, J.T. Lee, S.I. - 掲載資料名:
- Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-37
- 発行年:
- 1999
- 開始ページ:
- 616
- 終了ページ:
- 624
- 総ページ数:
- 9
- 出版情報:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772600 [1566772605]
- 言語:
- 英語
- 請求記号:
- E23400/99-37
- 資料種別:
- 国際会議録
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