1.

国際会議録
国際会議録
1. Binary and attenuated PSM mask evaluation for sub 50nm device development perspective
J. Moon ; B.-S. Nam ; J.-H. Jeong ; D.-H. Kong ; B.-H. Nam
出版情報: Optical Microlithography XXI.  2  pp.692436-1-692436-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6924
2.

国際会議録
国際会議録
2. Automatic residue removal for high-NA extreme illumination
J. Moon ; B.-S. Nam ; J.-H. Jeong ; D.-H. Kong ; B.-H. Nam
出版情報: Photomask technology 2007.  3  pp.67304B-1-67304B-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6730
3.

国際会議録
国際会議録
3. Effects of pattern size, dual side patterning, and imprint materials in the fabrication of antireflective structure using nanoimprint
D.-G. Choi ; K. J. Lee ; K.-D. Kim ; J.-H. Choi ; J.-H. Jeong
出版情報: Nanoengineering : fabrication, properties, optics, and devices V : 13-14 August 2008, San Diego, California, USA.  pp.70391E-1-70391E-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 7039
4.

国際会議録
国際会議録
4. DFM application on dual tone sub 50nm device
B.-S. Nam ; J. Moon ; J.-H. Jeong ; D.-H. Kong ; S. Oh
出版情報: Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA.  pp.692514-1-692514-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6925