1.

国際会議録
国際会議録
1. Transistor-based electrical test structures for lithography and process characterization
W. J. Poppe ; J. Holwill ; L. Pang ; P. Friedberg ; Q. Liu ; L. Alarcon ; A. Neureuther
出版情報: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6520
2.

国際会議録
国際会議録
2. Collaborative platform, tool-kit, and physical models for DfM
A. Neureuther ; W. Poppe ; J. Holwill ; E. Chin ; L. Wang ; J. Yang ; M. Miller ; D. Ceperley ; C. Clifford ; K. Kikuchi ; J. Choi ; D. Dornfeld ; P. Friedberg ; C. Spanos ; J. Hoang ; J. Chang ; J. Hsu ; D. Graves ; A. C. F. Wu ; M. Lieberman
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521
3.

国際会議録
国際会議録
3. DRC and mask friendly pattern and probe aberration monitors
J. Holwill ; A. R. Neureuther
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521
4.

国際会議録
国際会議録
4. Statistical analysis of gate CD variation for yield optimization
J. Holwill ; J. Kye ; Y. Zou
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521