1.

国際会議録
国際会議録
1. PRE-OXIDATION ANNEAL KINETICS: INTERFACE DEGRADATION OF THIN SiO2 FILMS ON SILICON
Poler, J.C. ; Irene, E.A.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.93-98,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
2.

国際会議録
国際会議録
2. PUMP-PROBE CHARGE INTEGRATING INVESTIGATION OF TRAP EMISSION KINETICS IN ULTRATHIN MOS CAPACITORS
Poler, J.C. ; Irene, E.A.
出版情報: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.241-246,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 284
3.

国際会議録
国際会議録
3. Thermal And Electron Cyclotron Resonance Plasma Oxidation Studies of Gallium Arsenide (GaAs)
Lefebvre, P.R. ; Zhao, C. ; Irene, E.A.
出版情報: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.262-274,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-2
4.

国際会議録
国際会議録
4. MICROROUGHNESS AT THE Si/SiO2 INTERFACE FROM PREOXIDATION ANNEALING, MEASURED USING QUANTUM OSCILLATIONS IN FOWLER NORDHEIM TUNNELING CURRENTS
Poler, J.C. ; McKay, K.K. ; Irene, E.A.
出版情報: Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.139-142,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 280
5.

国際会議録
国際会議録
5. Study of Interface Formation of (Ba,Sr)TiO3 Thin Films Grown by RF Sputter Deposition on Bare Si and Thermal SiO2/Si Substrates
Suvorova, N.A. ; Mueller, A.H. ; Suvorova, A.A. ; Saunders, M. ; Irene, E.A.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.373-378,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
6.

国際会議録
国際会議録
6. In Situ Study of Barrier Layers Using Spectroscopic Ellipsometry and Mass Spectroscopy of Recoiled Ions
Gao, Y. ; Mueller, A.H. ; Irene, E.A. ; Auciello, O. ; Krauss, A.R. ; Schultz, J.A.
出版情報: Recent developments in oxide and metal epitaxy : theory and experiment.  pp.135-140,  2000.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 619
7.

国際会議録
国際会議録
7. In Situ Real-Time Studies of Oxygen Incorporation in Complex Oxide Thin Films Using Spectroscopic Ellipsometry and Ion Scattering and Recoil Spectrometry
Mueller, A.H. ; Gao, Y. ; Irene, E.A. ; Auciello, O. ; Krauss, A.R. ; Schultz, J.A.
出版情報: Recent developments in oxide and metal epitaxy : theory and experiment.  pp.141-148,  2000.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 619
8.

国際会議録
国際会議録
8. Studies of Silicon Oxynitride Films Produced by Radio-Frequency Plasma Assisted Electron Cyclotron Resonance
Brewer, J.D. ; Raveh, A. ; Irene, E.A.
出版情報: Growth, evolution and properties of surfaces, thin films and self-organized structures : symposium held November 27-December 1, 2000, Boston, Massachusetts, U.S.A..  2001.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 648
9.

国際会議録
国際会議録
9. A Measurement of the Refractive Index of Ultrathin SiO2 Films and a Reevaluation of the Thermal Si Oxidation Kinetics in the Thin Film Regime
Hebert, K.J. ; Labayen, T. ; Irene, E.A.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.81-96,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1