1.

国際会議録
国際会議録
1. From speculation to specification: a discussion on how to define the tolerance of LER/LWR and its measurement methodology [6152-192]
Yamaguchi, A. ; Steffen, R. ; Kawada, H. ; Iizumi, T. ; Sugimoto, A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61524O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
2.

国際会議録
国際会議録
2. Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance
Yamaguchi, A. ; Tsuchiya, R. ; Fukuda, H. ; Komuro, O. ; Kawada, H. ; Iizumi, T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.689-698,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
3.

国際会議録
国際会議録
3. Bias-free measurement of LER/LWR with low damage by CD-SEM [6152-89]
Yamaguchi, A. ; Steffen, R. ; Kawada, H. ; Iizumi, T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
4.

国際会議録
国際会議録
4. Effect of various ArF resist shrinkage amplitudes on CD bias
Ke, C.-M. ; Gau, T.-S. ; Chen, P.-H. ; Yen, A. ; Lin, B.J. ; Otaka, T. ; Iizumi, T. ; Sasada, K. ; Ueda, K.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.997-1006,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
5.

国際会議録
国際会議録
5. Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM
Kawada, H. ; Iizumi, T. ; Otaka, T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.861-865,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
6.

国際会議録
国際会議録
6. Detection method for a T-topped profile in resist patterns by CD-SEM
Yamaguchi, A. ; Fukuda, H. ; Komuro, O. ; Yoneda, S. ; Iizumi, T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.874-880,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375
7.

国際会議録
国際会議録
7. Metrology of LER: influence of line-edge roughness (LER) on transistor performance
Yamaguchi, A. ; Ichinose, K. ; Shimamoto, S. ; Fukuda, H. ; Tsuchiya, R. ; Ohnishi, K. ; Kawada, H. ; Iizumi, T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.468-476,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375