1.

国際会議録
国際会議録
1. Characterization Of Silicon Dioxide Films Deposited In A Vertical Diffusion Furnace For Medium Temperature Applications
Watt, V.H.C. ; Nakatani, D. ; Moinpour, M. ; Hwang, D. ; Lu, W.
出版情報: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.328-337,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-16
2.

国際会議録
国際会議録
2. New applications of time prism pair in biomedical imaging system [6080-01]
Hwang, D. ; Lee Y W
出版情報: Advanced biomedical and clinical diagnostic systems IV : 22-24 January 2006, San Jose, California, USA.  pp.608001-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6080
3.

国際会議録
国際会議録
3. Selective Remote Plasma Etching of Si3N4 Over SIO2 at Elevated Temperature
Staffa, J. ; Luther, B. ; Hwang, D. ; Ruzyllo, J. ; Grant, R. ; March, D.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.283-289,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
4.

国際会議録
国際会議録
4. Nanostructuring of semiconductor materials and metallic thin films using femtosecond laser and scanning probe microscope
Chimmalgi, A. ; Choi, T. ; Hwang, D. ; Grigoropoulos, C.P.
出版情報: Commercial and biomedical applications of ultrafast lasers III : 28-30 January 2003, San Jose, California, USA.  pp.129-137,  2003.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4978
5.

国際会議録
国際会議録
5. Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements
Roman, P. ; Hwang, D. ; Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.401-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
6.

国際会議録
国際会議録
6. Physics and Prospects of Sub-2 urn Oxides
Alam, M.A. ; Weir, B. ; Silverman, P. ; Bude, J. ; Chetti, A. ; Ma, Y. ; Brown, M.M. ; Hwang, D. ; Hamad, A.
出版情報: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.365-376,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-2
7.

国際会議録
国際会議録
7. Evaluation of MRI DTI-tractography by tract-length histogram
Singh, M. ; Hwang, D. ; Sungkarat, W. ; Veera, K.
出版情報: Medical Imaging 2005: Physiology, Function, and Structure from Medical Images.  pp.138-147,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5746
8.

国際会議録
国際会議録
8. A statistical approach to distributed edge sensor detection
Hwang, D. ; Hwang, C.-H. ; Kuo, C.-C.J.
出版情報: Internet Quality of Service.  pp.66-76,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5245