1.

国際会議録
国際会議録
1. Parameters study to improve sidewall roughness in advanced silicon etch process
Liu, H.-C. ; Lin, Y.-H. ; Chou, B.C.S. ; Hsu, Y.-Y. ; Hsu, W.
出版情報: Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia.  pp.503-513,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4592
2.

国際会議録
国際会議録
2. Sub-band denoising and spline curve fitting method for hemodynamic measurement in perfusion MRI
Lin, H.-D. ; Huang, H.-L. ; Hsu, Y.-Y. ; Chen, C.-C. ; Chen, I.-Y. ; Wu, L.-C. ; Liu, R.-S. ; Lin, K.-P.
出版情報: Medical Imaging 2003: Physiology and Function: Methods, Systems, and Applications.  pp.440-449,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5031