Alternating PSM for sub-60-nm DRAM gate single exposure [6349-66]
- 著者名:
Chen, K. Lu, R. Fu, K. K. Hsia, C. Shih, C.-L. Lin, J. ( Nanya Technology Corp. (Taiwan) ) - 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 63491T
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |