1.

国際会議録
国際会議録
1. Thermogravimetric Analysis of Polyamic Acid Esters
Bachman, B. ; Houlihan, F.
出版情報: ANTEC 88, Atlanta, April 18-21, 1988, Conference proceedings : plastics are shaping tomorrow today : Society of Plastics Engineers 46th annual technical conference & exhibits.  pp.1045-1048,  1988.  Brookfield, CT.  Society of Plastics Engineers, Inc. (SPE)
シリーズ名: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
シリーズ巻号: 34
2.

国際会議録
国際会議録
2. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
3.

国際会議録
国際会議録
3. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
出版情報: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6153