1.

国際会議録
国際会議録
1. INTEGRATED PREDEPOSITION CLEANING/PASSIVATION OF Si SURFACES FOR MOS DEVICES WITH Si02/Si INTERFACES
Hattangady, S. ; Misra, V. ; Yasuda, T. ; Xu, X.L. ; Hornung, B. ; Lucovsky, G. ; Wortman, J.J.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.288-295,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
2.

国際会議録
国際会議録
2. CONTROL OF Si-SiO2 INTERFACE PROPERTIES IN MOS DEVICES PREPARED BY PLASMA-ASSISTED AND RAPID THERMAL PROCESSES
Lucovsky, G. ; Yasuda, T. ; Ma, Y. ; Hattangady, S. V. ; Xu, X-L. ; Misra, V. ; Hornung, B. ; Wortman, J. J.
出版情報: Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.81-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 318
3.

国際会議録
国際会議録
3. A dual-function UHV-Compatible chamber for (i) low-temperature plasma-assisted oxidation, and (ii) high-temperature rapid thermal processing of Si-based dielelctric gate heterostructures
Hattangady, S. ; Xu, X-L ; Watkins, M. J. ; Hornung, B. ; Misra, V. ; Lucovsky, G. ; Wortman, J. J.
出版情報: III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A..  pp.581-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 300