1.

国際会議録
国際会議録
1. Depth profile characterization of hydrogen implanted silicon using spectroscopic ellipsometry
Gubiotti, T. ; Jacy, D. ; Hoobler, R.J.
出版情報: Process and Materials Characterization and Diagnostics in IC Manufacturing.  pp.105-114,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5041
2.

国際会議録
国際会議録
2. Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology
Apak, E. ; Sarathy, T.P. ; McGahan, W.A. ; Rovira, P.I. ; Hoobler, R.J.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.708-719,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
3.

国際会議録
国際会議録
3. Optical critical dimension (OCD) measurments for profile monitoring and control: applications for mask inspection and fabrication
Hoobler, R.J. ; Apak, E.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.638-645,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
4.

国際会議録
国際会議録
4. Characterization of interfacial layers and surface roughness using spectroscopic reflectance, spectroscopic ellipsometry, and atomic force microscopy
Hoobler, R.J. ; Korlahalli, R. ; Boltich, E. ; Serafin, J.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.756-764,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689