Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium. pp.241-252, 2001. Pennington, N.J.. Electrochemical Society
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.113-124, 2000. Pennington, N.J.. Electrochemical Society
Taniguchi, K. ; Hamaguchi, C. ; Kobayashi, K. ; Hirayama, M.
出版情報:
SiO[2] and its interfaces : symposium held November 30-December 5, 1987, Boston, Massachusetts, U.S.A.. pp.139-144, 1988. Pittsburgh, Pa.. Materials Research Society
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.223-230, 1997. Pennington, NJ. Electrochemical Society
Ohmi, T. ; Sekine, K. ; Kaihara, R. ; Saito, Y. ; Shirai, Y. ; Hirayama, M.
出版情報:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.3-, 1999. Warrendale, PA. MRS - Materials Research Society
Taniguchi, K. ; Hamaguchi, C. ; Kobayashi, K. ; Hirayama, M.
出版情報:
Multilayers : synthesis, properties, and non-electronic applications : symposium held December 2-4, 1987, Boston, Massachusetts, U.S.A.. pp.139-144, 1988. Pittsburgh, Pa.. Materials Research Society
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