1.

国際会議録
国際会議録
1. Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility
Kizilyalli,I.C. ; Abein,G. ; Chen,Z. ; Weber,G.R. ; Register,F. ; Harris,E. ; Chetlur,S. ; Higashi,G.S. ; Schofieled,M. ; Sen,S. ; Kotzias,B. ; Roy,P.K. ; Lyding,J.W. ; Hess,K.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.141-146,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
2.

国際会議録
国際会議録
2. Influence of oxygen precipitates on the measurement of minority carrier diffusion length in p-type silicon material using surface photovoltage technique
Ma,Y. ; Lee,J.L. ; Benton,J.L. ; Boone,T. ; Eaglesham,D.J. ; Higashi,G.S.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing.  pp.17-24,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3215