1.

国際会議録
国際会議録
1. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
2.

国際会議録
国際会議録
2. ALD HfO2 Surface Preparation Study
Delabie, Annelies ; Caymax, M. ; Maes, J.W. ; Bajolet, P. ; Brijs, B. ; Cartier, E. ; Conard, T. ; Gendt, S.De ; Richard, O. ; Vandervorst, W. ; Zhao, C. ; Green, M. ; Tsai, W. ; Heyns, M.M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.179-184,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
3.

国際会議録
国際会議録
3. DEVELOPMENT OF ADVANCED CORROSION FREE ORGANIC STRIPPERS FOR ULSI PROCESSING
Rotondaro, A.L.P. ; Honda, K. ; Maw, T. ; Perry, D. ; Lux, M. ; Heyns, M.M. ; Claeys, C. ; Darakchiev, I.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.537-543,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
4.

国際会議録
国際会議録
4. SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE
Mertens, P.W. ; Verhaverbeke, S. ; Heyns, M.M. ; Hellemans, L. ; Snauwaert, J. ; Dillenbeck, K.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.102-110,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
5.

国際会議録
国際会議録
5. THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES
Verneire, B. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Verhaverbeke, S. ; Heyns, M.M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.58-64,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
6.

国際会議録
国際会議録
6. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
7.

国際会議録
国際会議録
7. APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
Wolke, K. ; Riedel, T. ; Haug, R. ; De Gendt, S. ; Heyns, M.M. ; Meuris, M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.204-211,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
8.

国際会議録
国際会議録
8. A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS
De Smedt, F. ; De Gendt, S. ; Cornelissen, I. ; Heyns, M.M. ; Vinckier, C.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.407-415,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
9.

国際会議録
国際会議録
9. EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS
De Gendt, S. ; Lux, M. ; Claes, M. ; Van Hoeymissen, J. ; Conrad, T. ; Worth, W. ; Lagrange, S. ; Bergman, E. ; Jassal, A.S. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.391-398,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
10.

国際会議録
国際会議録
10. EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING
Kesters, E. ; Ghekiere, J. ; Van Doorne, P. ; Vereecke, G. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.15-22,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26