1.

国際会議録
国際会議録
1. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.415-422,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
2.

国際会議録
国際会議録
2. AltPSM inspection capability and printability of quartz defects
Heumann, J.P. ; Zarrabian, M. ; Hennig, M. ; Dettmann, W. ; Zurbrick, L.S. ; Lang, M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
3.

国際会議録
国際会議録
3. Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques
Zurbrick, L.S. ; Heumann, J.P. ; Rudzinski, M.W. ; Stokowski, S.E. ; Urbach, J.-P ; Wang, L.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.511-516,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
4.

国際会議録
国際会議録
4. Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results
Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.410-421,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Defect inspection of quartz-PSMs: taking a leap forward
Heumann, J.P. ; Schurack, F. ; Dettmann, W. ; Zurbrick, L. ; Lang, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.346-354,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375