1.

国際会議録
国際会議録
1. EFFECTS OF RESIDUAL IRON CONTAMINATION INTRODUCED DURING WET CHEMICAL PROCESSING ON THIN OXIDE BREAKDOWN AND RELIABILITY CHARACTERISTICS
Henley, W.B. ; Jastrzebski, L. ; Haddad, N.F.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.487-494,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
2.

国際会議録
国際会議録
2. Diffusion of Iron Contamination in Silicon Dioxide
Ramappa, D.A. ; Henley, W.B.
出版情報: Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium.  pp.219-222,  1999.  Pennington, New Jersey.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-6