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出版情報:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.209-216, 2000. Pennington, N.J.. Electrochemical Society
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.296-306, 1994. Pennington, NJ. Electrochemical Society
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.137-144, 1999. Pennington, NJ. Electrochemical Society