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Developments in X-ray tomography V : 15-17 August 2006, San Diego, California, USA. pp.63180T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
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Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. pp.379-388, 1994. Pennington, NJ. Electrochemical Society
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.198-204, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
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出版情報:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.411-419, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
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Zeolites and mesoporous materials at the dawn of the 21st century : proceedings of the 13th International Zeolite Conference, Montpellier, France, 8-13 July 2001. pp.277-277, 2001. Amsterdam. Elsevier
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The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.181-186, 2000. Pennington, N.J.. Electrochemical Society