1.

国際会議録
国際会議録
1. Ambient Dependence of Agglomeration Stability of Cu/Ta Films
Hartman, J. W. ; Atwater, H. A. ; Hashim, Imran ; Chin, Barry ; Chen, Fusen
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.303-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
2.

国際会議録
国際会議録
2. Quantitative RHEED analysis of biaxially-textured polycrystalline MgO films on amorphous substrates grown by ion beam-assisted deposition
Brewer, R. T. ; Hartman, J. W. ; Atwater, Harry A.
出版情報: Fundamental mechanisms of low-energy-beam-modified surface growth and processing : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A..  pp.75-,  2000.  Warrendale, Pa..  MRS-Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 585
3.

国際会議録
国際会議録
3. Agglomeration of Cu Electroplating Seed Layers on Ultra-Thin Ta, Ta1-xNx, Ta1-xOx, Contaminated Ta, and Composite Ta/Ta1-xNx Diffusion Barriers
Hartman, J. W. ; Yeh, H. ; Atwater, H. A. ; Hashim, I.
出版情報: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.257-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 564
4.

国際会議録
国際会議録
4. Plasmonics: Electromagnetic Energy Transfer And Switching In Nanoparticle Chain-Arrays Below The Diffraction Limit
Atwater, H. H. ; Brongersma, M. L. ; Hartman, J. W.
出版情報: Molecular electronics : symposium held November 29 - December 2, 1999, Boston, Massachusetts, U.S.A./ editors, Sokrates T. Pantelides ... [et al.].  pp.H10.5-,  2001.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 582