1.

国際会議録
国際会議録
1. High Throughput SiC Wafer Polishing with Good Surface Morphology
T. Kato ; K. Wada ; E. Hozomi ; H. Taniguchi ; T. Miura ; S.I. Nishizawa ; K. Arai
出版情報: Silicon carbide and related materials 2006 : ECSCRM 2006, Proceedings of the 6th European Conference on Silicon Carbide and Related Materials, Newcastle upon Tyne, UK, September 2006.  pp.753-756,  2007.  Stafa-Zuerich.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 556-557
2.

国際会議録
国際会議録
2. Defect and Growth Analysis of SiC Bulk Single Crystals with High Nitrogen Doping
T. Kato ; T. Miura ; K. Wada ; E. Hozomi ; H. Taniguchi ; S.I. Nishizawa ; K. Arai
出版情報: Silicon carbide and related materials 2006 : ECSCRM 2006, Proceedings of the 6th European Conference on Silicon Carbide and Related Materials, Newcastle upon Tyne, UK, September 2006.  pp.239-242,  2007.  Stafa-Zuerich.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 556-557
3.

国際会議録
国際会議録
3. Enlargement Growth of Large 4H-SiC Bulk Single Crystal
T. Kato ; T. Miura ; I. Nagai ; H. Taniguchi ; H. Kawashima
出版情報: Silicon Carbide and Related Materials 2010 : Selected, peer reviewed papers from the 8th European Conference on Silicon Carbide and Related Materials (ECSCRM 2010), held in Oslo (Sundvolden Conference Centre), Norway, August 29th - September 2nd.  pp.3-7,  2011.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 679-680
4.

国際会議録
国際会議録
4. High-power injection lock laser platform for ArF dry/wet lithography
H. Mizoguchi ; T. Inoue ; J. Fujimoto ; T. Yamazaki ; T. Suzuki ; T. Matsunaga ; S. Sakanishi ; M. Kaminishi ; Y. Watanabe ; T. Ohta ; M. Nakane ; M. Moriya ; T. Nakaike ; M. Shinbori ; M. Yoshino ; T. Kawasuji ; H. Nogawa ; T. Ito ; H. Umeda ; S. Tanaka ; H. Taniguchi ; Y. Sasaki ; J. Kinoshita ; T. Abe ; H. Tanaka ; H. Hayashi ; K. Miyao ; M. Niwano ; A. Kurosu ; M. Yashiro ; H. Nagano ; N. Matsui ; T. Mimura ; K. Kakizaki ; M. Goto
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.780-789,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
5.

国際会議録
国際会議録
5. Post exposure bake unit equipped with wafer-shape compensation technology
S. Goto ; A. Morita ; K. Oyama ; S. Hori ; K. Matsuchika ; H. Taniguchi
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
6.

国際会議録
国際会議録
6. Shared transistor architecture with diagonally connected pixels for CMOS image sensors
Y. Kudoh ; F. Koga ; T. Abe ; H. Taniguchi ; M. Sato ; H. Ishiwata ; S. Ooki ; R. Suzuki ; H. Mori
出版情報: Sensors, cameras, and systems for scientific/industrial applications VIII : 30 January-1 February 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6501