1.

国際会議録
国際会議録
1. HRTEM Study of Phase Transformation from Anatase to Rutile in Nanocrystalline TiO2 Particles
K.H. Kim ; H. Park ; J.P. Ahn ; J.C. Lee ; J.K. Park
出版情報: Progress in powder metallurgy : proceedings of the 2006 Powder Metallurgy World Congress & Exhibition (PM 2006), held in Busan Exhibition & Convention Center (BEXCO), Busan, Korea, September 24-28, 2006.  pp.65-68,  2007.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 534-536
2.

国際会議録
国際会議録
2. In Situ TEM Observation on Phase Formation of TiO2 Nanoparticle Synthesized by Flame Method
H.S. Jie ; H. Park ; K.H. Kim ; J.P. Ahn ; J.K. Park
出版情報: Progress in powder metallurgy : proceedings of the 2006 Powder Metallurgy World Congress & Exhibition (PM 2006), held in Busan Exhibition & Convention Center (BEXCO), Busan, Korea, September 24-28, 2006.  pp.81-84,  2007.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 534-536
3.

国際会議録
国際会議録
3. Effect of Different Chemical and Physical Characteristic Having Lignocellulosic Fibers on Heavy Metal Ion Removal from Auqueous Solution
H.J. Lee ; B.G. Lee ; D.Y. Shin ; H. Park
出版情報: Eco-materials processing and design IX : selected, peer reviewed papers from 9th International Symposium on Eco-Materials Processing and Design, Changwon Convention Centre, Changwon City, Korea, January 07-09, 2008.  pp.285-288,  2008.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 569
4.

国際会議録
国際会議録
4. Local mismatch location and spatial scale detection in image registration
R. Narayanan ; J. A. Fessler ; B. Ma ; H. Park ; C. R. Meyer
出版情報: Medical imaging 2007, Image processing : 18-20 February 2007, San Diego, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6512
5.

国際会議録
国際会議録
5. Joint registration of multiple images using entropic graphs
B. Ma ; R. Narayanan ; H. Park ; A. O. Hero ; P. H. Bland ; C. R. Meyer
出版情報: Medical imaging 2007, Image processing : 18-20 February 2007, San Diego, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6512
6.

国際会議録
国際会議録
6. Solvent Effect on Ion Hopping of Solid Polymer Electrolyte
Y.J. Lee ; Y.K. Jo ; H. Park ; H.H. Chun ; N.J. Jo
出版情報: Eco-materials processing and design VIII : ISEPD-8, proceedings of the 8th International Symposium on Eco-Materials Processing and Design, January 11-13, 2007, Kitakyushu, Japan.  pp.1049-1052,  2007.  Stafa-Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 544-545
7.

国際会議録
国際会議録
7. Properties of Cement Paste Using Mine Tailing and Polymer Materials
K.N. Kim ; J.H. Kim ; D.Y. Shin ; B.G. Lee ; H. Park
出版情報: Eco-materials processing and design X : selected peer reviewed papers from the 10th International Symposium on Eco-Materials Processing and Design, ISEPD, Xian, China, January 13-15, 2009.  pp.623-626,  2009.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 620-622
8.

国際会議録
国際会議録
8. Leakage Current-Free Pixel Structure Using a Blocking Transistor for Active-Matrix Display
H. Park ; W. Lee ; S. Kuk ; M. Han
出版情報: 2007 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT).  pp.65-70,  2007.  Pennington, N.J..  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 8(1)
9.

国際会議録
国際会議録
9. Effect of Organic Amine in Colloidal Silica Slurry on Polishing-rate Selectivity of Copper to Tantalum-nitride Film in Copper Chemical Mechanical Planarization
J. Park ; H. Cui ; H. Hwang ; U. Paik ; H. Park
出版情報: Chemical Mechanical Polishing 9.  pp.51-57,  2008.  Pennington, N.J..  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 13(4)
10.

国際会議録
国際会議録
10. Effect of Alkaline Agent with Organic Additive in Colloidal Silica Slurry on Polishing Rate Selectivity of Polysilicon-to-SiO2 in Polysilicon CMP
H. Hwang ; H. Kang ; J. Park ; U. Paik ; H. Park
出版情報: Chemical Mechanical Polishing 9.  pp.67-73,  2008.  Pennington, N.J..  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 13(4)