1.

国際会議録
国際会議録
1. A Self-Aligned Silicide Process Utilizing Ion Implants For Reduced Silicon Consumption And Control Of The Silicide Formation Temperature
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.35-40,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
2.

国際会議録
国際会議録
2. Formation of Nanometer-Scale Dot Arrays from Diblock Copolymer Templates
Black, C.T. ; Guarini, K.W. ; Sandstrom, R.L. ; Yeung, S. ; Zhang, Y.
出版情報: Functional nanostructured materials through multiscale assembly and novel patterning techniques : symposium held April 2-5, 2002, San Francisco, California, U.S.A..  pp.79-172,  2002.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 728
3.

国際会議録
国際会議録
3. A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.89-94,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 686