1.

国際会議録
国際会議録
1. Plasma Enhanced Chemical Vapor Deposition of Silicon Dioxide and Nitride Films Using the Enviromnentally Benign Precursor Diethylsilane
Chen, L. ; Levy, R.A. ; Grow, J.M. ; Yu, Y.
出版情報: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.510-515,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-5
2.

国際会議録
国際会議録
2. Similarities in the Growth Mechanism for the Synthesis of Silicon Carbide, Silicon Nitride, and Silicon
Grow, J.M.
出版情報: Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty-Eighth State-of-the-Art Program on Compound Semiconductors.  pp.623-631,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-2
3.

国際会議録
国際会議録
3. Growth Kinetics And Properties of Silicon Carbide Films Synthesized by Low Pressure Chemical Vapor Deposition
Grow, J.M.
出版情報: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.60-72,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-2
4.

国際会議録
国際会議録
4. Low Pressure Chemical Vapor Deposition of Copper Films by Direct Injection of(hfac)Cu(TMVS)
Levy, R.A. ; King, W.S. ; Perese, D. ; Grow, J.M. ; Albella, J.M.
出版情報: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.782-786,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-5
5.

国際会議録
国際会議録
5. Low Pressure Chemical Vapor Deposition of Silicon Nitride Using the Environmentally Benign Precursor Tris(Dimethylamino)silane
Levy, R.A. ; Lin, X. ; Grow, J.M.
出版情報: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.239-246,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-5